Feature CD vs Dose Sensitivity
Line width variations by dose modulations are a hard-to-understand setup but can significantly impact the lithography results. With the help of the E-Beam simulation we want to investigate the impact of dose changes to these variations and provide some guidelines for the process to be derived from the findings.
E-Beam module simulates energy distribution of electrons and calculates the exposure result with high accuracy. Its combination with loop module shows flexibility in modelling with variables. The flow is demonstrated to simulate the CD vs Dose sensitivity for an arbitrary feature in a standard layout.