EIPBN BEAMeeting 2024
The GenISys EIPBN BEAMeeting 2024 took place on Tuesday, May 28th at the Hilton La Jolla Torrey Pines, California, and was a tremendous success both on-site and online. The event had nearly 100 attendees in person, with many more participating remotely.
Uli Hofmann, General Manager, and Nezih Ünal, Vice President of GenISys, attended the meeting along with a team from our headquarters and regional offices. They presented updates on GenISys and our products, along with insightful application solutions. Our users also shared valuable experiences and application cases, such as Bethany Niedzielski Huffman from MIT Lincoln Lab on “Quantum Computing and Electron Beam Lithography,” and Leo Ocola from IBM on advanced proximity effect corrections. The BEAMeeting featured extensive technical exchanges and stimulating discussions.
On Friday, May 31st, we hosted a Metrology Luncheon Workshop focused on SEM metrology and our new solution, InSPEC. Approximately 50 attendees learned about this integrated software suite and upgrade kit for automated multi-chip SEM metrology. The intense discussions on current metrology requirements and new possibilities showed great interest from the attendees, and merged into the EIPBN sessions with a related talk given by Chad Eichfeld from Penn State University.
We extend our heartfelt thanks to everyone who participated in the BEAMeeting and Metrology Luncheon sessions, making these events successful.
Below are the BEAMeeting presentations and recorded videos.
BEAMeeting Presentations
GenISys Intro
Laser Simulation and Process Calibration
Quantum Computing and Electron Beam Lithography
Building Bridges in BEAMER Lithography
Maximizing process efficiency with dual current exposure strategy
Unveiling the NEW InSPEC
Image processing and Data Preparation for Structural Color Generation
Distortion Correctioni and Application
Automated SEM Metrology Use Cases for InSPEC
MPO100 The Future of 3D Nano-and Micro-Lithography
Radial PEC Powerful Filter and the new Fields module
ProSEM vs InSPEC the best metrology solution
BEAMER Update
BEAMeeting Videos
GenISys Intro
Laser Simulation and Process Calibration
Quantum Computing and Electron Beam Lithography
Building Bridges in BEAMER Lithography
Maximizing process efficiency with dual current exposure strategy
Unveiling the NEW InSPEC
Image processing and Data Preparation for Structural Color Generation
Distortion Correctioni and Application
Automated SEM Metrology Use Cases for InSPEC
MPO100 The Future of 3D Nano-and Micro-Lithography
Radial PEC Powerful Filter and the new Fields module
ProSEM vs InSPEC the best metrology solution
BEAMER Update