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    • Bulk & sleeving of patterns for time writing optimisation
    • Fracturing of periodic layouts for photonic crystals
    • Designing Fresnel zone plates using formulas in BEAMER
    • SÜSS-MicroOptics Source Mask Optimisation
    • LAB simulation methods and Optical Proximity Correction in Lithography
    • Multipass Techniques
    • 3D E-beam lithography
    • Using TRACER to Estimate the Base-Dose for Different Substrates
    • Filling arbitrary shapes with tilted gratings
    • Laser Grayscale Lithography
    • Dose Assignments for Exposures on Thin Membranes
    • Exposure Strategies for Optimised Writing
    • Influence of Shape PEC on Resist Profile
    • Projection Simulation Example
    • Managing PEC Data Volume to Improve Throughput
    • Pattern replacement and filtering for post processing
    • Optimisation of relative dose exposure for critical features
    • Loops, Variables and Functions
    • Using Loop module in BEAMER
    • Exposure dose for targets and large areas
    • 3D Correction for Dolan Technique
  • In-Action
    • Webinar Series: Proximity Effect in E-Beam Lithography
    • Webinar Series: BEAMER Training
    • Webinar: LAB Simulation of Proximity Lithography
    • Webinar: LAB Simulation of Projection Lithography
    • Webinar: LAB Simulation of Laser Lithography
    • Webinar: LAB Simulation of E-BEAM Lithography
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GenISys GmbH
Skip navigation
  • Products
    • BEAMER
    • LAB
    • TRACER
    • MASKER
    • ProSEM
    • InSPEC
  • Applications
    • Bulk & sleeving of patterns for time writing optimisation
    • Fracturing of periodic layouts for photonic crystals
    • Designing Fresnel zone plates using formulas in BEAMER
    • SÜSS-MicroOptics Source Mask Optimisation
    • LAB simulation methods and Optical Proximity Correction in Lithography
    • Multipass Techniques
    • 3D E-beam lithography
    • Using TRACER to Estimate the Base-Dose for Different Substrates
    • Filling arbitrary shapes with tilted gratings
    • Laser Grayscale Lithography
    • Dose Assignments for Exposures on Thin Membranes
    • Exposure Strategies for Optimised Writing
    • Influence of Shape PEC on Resist Profile
    • Projection Simulation Example
    • Managing PEC Data Volume to Improve Throughput
    • Pattern replacement and filtering for post processing
    • Optimisation of relative dose exposure for critical features
    • Loops, Variables and Functions
    • Using Loop module in BEAMER
    • Exposure dose for targets and large areas
    • 3D Correction for Dolan Technique
  • In-Action
    • Webinar Series: Proximity Effect in E-Beam Lithography
    • Webinar Series: BEAMER Training
    • Webinar: LAB Simulation of Proximity Lithography
    • Webinar: LAB Simulation of Projection Lithography
    • Webinar: LAB Simulation of Laser Lithography
    • Webinar: LAB Simulation of E-BEAM Lithography
  • Download
    • BEAMER Download
    • TRACER Download
    • LAB Download
    • VIEWER Download
  • Corporate
    • News & Events
    • GenISys Profile
    • GenISys History
    • Career Opportunities
  • Login
  • Contact

Applications

Bulk & sleeving of patterns for time writing optimisation

Fracturing of periodic layouts for photonic crystals

Designing Fresnel zone plates using formulas in BEAMER

SÜSS-MicroOptics Source Mask Optimisation

LAB simulation methods and Optical Proximity Correction in Lithography

Multipass Techniques

3D E-beam lithography

Using TRACER to Estimate the Base-Dose for Different Substrates

Filling arbitrary shapes with tilted gratings

Laser Grayscale Lithography

Dose Assignments for Exposures on Thin Membranes

Exposure Strategies for Optimised Writing

Influence of Shape PEC on Resist Profile

Projection Simulation Example

Managing PEC Data Volume to Improve Throughput

Pattern replacement and filtering for post processing

Optimisation of relative dose exposure for critical features

Loops, Variables and Functions

Using Loop module in BEAMER

Exposure dose for targets and large areas

3D Correction for Dolan Technique

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