GenISys Profile


Based in Munich (Germany) with offices in Japan and USA, GenISys serves markets in lithography and inspection with flexible, high-performance software solutions for the optimization of micro and nano fabrication as well as metrology and inspection. GenISys combines deep technical expertise in layout data processing, lithography process modeling, correction and optimization, physics-based simulation, image analysis, and measurement algorithms with world class software engineering.

With a strong focus on ease of use and application requirements, GenISys products give engineers, manufacturers, and tool suppliers unparalleled efficiency and optimal value in research, development, and production of future nano technologies. This includes areas like integrated circuits, photonic circuits and devices, DOE, quantum technology, MEMS, or mask making. As a customer driven company, GenISys delivers fast, highly dedicated support for development and application of advanced functionality to meet demanding customer needs.

Since its foundation in 2005, GenISys has become a global market leader in the field of electron beam lithography software and is expanding to related markets and applications. For electron and laser beam direct write and mask manufacturing, our data preparation and proximity effect correction, lithography simulation, and OPC software helps pushing the limits. Moreover, with extended metrology and inspection packages, GenISys solutions enable SEM-based process calibration and monitoring.

We are constantly seeking talented individuals – at GenISys you will find the challenge, variety, and opportunity to apply your skills to some of the most interesting topics in the nano world.