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    • Designing Fresnel zone plates using formulas in BEAMER
    • SÜSS-MicroOptics Source Mask Optimisation
    • LAB simulation methods and Optical Proximity Correction in Lithography
    • Multipass Techniques
    • 3D E-beam lithography
    • Using TRACER to Estimate the Base-Dose for Different Substrates
    • Filling arbitrary shapes with tilted gratings
    • Laser Grayscale Lithography
    • Dose Assignments for Exposures on Thin Membranes
    • Exposure Strategies for Optimised Writing
    • Influence of Shape PEC on Resist Profile
    • Projection Simulation Example
    • Managing PEC Data Volume to Improve Throughput
    • Pattern replacement and filtering for post processing
    • Optimisation of relative dose exposure for critical features
    • Loops, Variables and Functions
    • Using Loop module in BEAMER
    • Exposure dose for targets and large areas
    • 3D Correction for Dolan Technique
  • In-Action
    • Webinar Series: Proximity Effect in E-Beam Lithography
    • Webinar Series: BEAMER Training
    • Webinar: LAB Simulation of Proximity Lithography
    • Webinar: LAB Simulation of Projection Lithography
    • Webinar: LAB Simulation of Laser Lithography
    • Webinar: LAB Simulation of E-BEAM Lithography
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GenISys GmbH
Skip navigation
  • Products
    • BEAMER
    • LAB
    • TRACER
    • MASKER
    • ProSEM
    • InSPEC
  • Applications
    • Bulk & sleeving of patterns for time writing optimisation
    • Fracturing of periodic layouts for photonic crystals
    • Designing Fresnel zone plates using formulas in BEAMER
    • SÜSS-MicroOptics Source Mask Optimisation
    • LAB simulation methods and Optical Proximity Correction in Lithography
    • Multipass Techniques
    • 3D E-beam lithography
    • Using TRACER to Estimate the Base-Dose for Different Substrates
    • Filling arbitrary shapes with tilted gratings
    • Laser Grayscale Lithography
    • Dose Assignments for Exposures on Thin Membranes
    • Exposure Strategies for Optimised Writing
    • Influence of Shape PEC on Resist Profile
    • Projection Simulation Example
    • Managing PEC Data Volume to Improve Throughput
    • Pattern replacement and filtering for post processing
    • Optimisation of relative dose exposure for critical features
    • Loops, Variables and Functions
    • Using Loop module in BEAMER
    • Exposure dose for targets and large areas
    • 3D Correction for Dolan Technique
  • In-Action
    • Webinar Series: Proximity Effect in E-Beam Lithography
    • Webinar Series: BEAMER Training
    • Webinar: LAB Simulation of Proximity Lithography
    • Webinar: LAB Simulation of Projection Lithography
    • Webinar: LAB Simulation of Laser Lithography
    • Webinar: LAB Simulation of E-BEAM Lithography
  • Download
    • BEAMER Download
    • TRACER Download
    • LAB Download
    • VIEWER Download
  • Corporate
    • News & Events
    • GenISys Profile
    • GenISys History
    • Career Opportunities
  • Login
  • Contact

In-Action

Webinar Series: Proximity Effect in E-Beam Lithography

Webinar Series: BEAMER Training

Webinar: Simulation of Proximity Lithography

Webinar: Simulation of Projection Lithography

Webinar: Simulation of Laser Lithography

Webinar: LAB Simulation of E-BEAM Lithography

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